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| 论文题目: | Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification |
| 论文题目英文: | |
| 作者: | 张志强 |
| 论文出处: | |
| 刊物名称: | Microelectronic Engineering |
| 年: | 2014 |
| 卷: | 128 |
| 期: | |
| 页: | 59-65 |
| 联系作者: | 张志强,黎海文 |
| 收录类别: | |
| 影响因子: | 1.338 |
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